High-Precision Aluminum Alloy Sheet FP52

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For Use in Semiconductor/Liquid-crystal Manufacturing Equipment and Various Processing Jigs

Picture of FP52 high-precision aluminum alloy sheet

Because thick aluminum plates have high conductivity, excellent can be processed easily and are lightweight, they find use in many types of equipment and molds. Our general-purpose thick aluminum plates are used in making FP52, which is regarded for its excellent characteristics including thickness, flatness, residual stress and surface quality. FP52 therefore helps customers to reduce costs.

Features

  • Owing to its JIS 1/10 high thickness accuracy, these material plates can be used as is.
  • Having JIS 1/30–1/50 flatness, these products can be used as is, without cutting.
  • Eliminating residual stresses minimizes distortion during cutting operations.
  • To maintain high surface quality, films are applied to both sides of the plates to prevent scratching during processing.

Product Characteristics

Chemical composition (%)

Si Fe Cu Mn Mg Cr Other
(Individual)
Other
(Total)
AL
0.25 or less 0.40 or less 0.10 or less 0.10 or less 2.2–2.8 0.15–0.35 0.05 or less 0.15 or less Remaining

Thickness accuracy (mm)

Thickness Plate thickness tolerance
4–7 ±0.04
8–12 ±0.05
15/16 ±0.08
18 ±0.09
20/22 ±0.10
25 ±0.12
30 ±0.15
35/40 ±0.20
45/50 ±0.25
55/60 ±0.30

(Reference) JIS plate thickness tolerance (Width: 900 mm or more, 1400 mm or less)

Thickness Plate thickness tolerance
4 ±0.35
6 ±0.45
8 ±0.50
10 ±0.60
12/15/16 ±0.70
18/20/22 ±0.80
25 ±0.90
30/35 ±1.0
40 ±1.1
45/50 ±1.3
55 ±1.5
60 ±1.9

Flatness

FP52 0.2mm or less/m width and length
Our general-purpose material 1.2mm or less/m width and length

Mechanical properties, JIS compliance

Thickness Tensile strength (N/mm2) Stretch (%)
FP52 T20 mm 195 34
JIS standards
(H112)
4≦T≦6.5 195 or more 9 or more
6.5<T≦13 7 or more
13<T≦50 175 or more 12 or more
50<T≦75 16 or more

Residual stress

No distortions during machining or cutting processes

Graph of Residual stress

Picture of Residual stress